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  • Long-Term Reliability of Nanometer VLSI Systems

    Modeling, Analysis and Optimization

    This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent developments in the modeling, analysis and optimization of the reliability effects from EM and BTI ... Read more

    $143.09 USD